Table 1: List of areas in the design-process flow where layout can be optimized to enable EUV-friendly layout. Tight pitch routing metal with high-NA EUV One of the most challenging patterning layers ...

"Our expansion into instrumentation naturally extends from our thermal imaging expertise. As a subsidiary of HIKVISION established in 2016, HIKMICRO is one of the few manufacturers that integrates ...

Originally Published March 2001 Andrew Snow Successful risk management is essential to the design and development of safe and effective medical devices. Unfortunately, it is too often viewed by ...

XCMG has participated in the full design and development process of CUMT Nanhu and will be one of its future users. The satellite will enable unified planning of personnel, vehicles, and sites to ...