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Plasma technique doubles etch rate for 3D NAND flash memoryHowever, the process, known as reactive ion etching, isn't fully understood and could be improved. One recent development involves keeping the wafer––the sheet of semiconductor material to be ...
Convenience and cost aside, there are a ton of valid reasons to spin up your own boards, ranging from not having to wait for shipping to just wanting to control the process yourself. Whichever ...
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Tech Xplore on MSNNovel transparent ceramics extend life of semiconductor etching equipmentSimilar to how a ship rusts when exposed to seawater, plasma used during the etching process continuously reacts with the internal components of the equipment, leading to corrosion and contamination.
During the fabrication process, we need to etch out the unwanted oxide layer from the wafer, which can be done using plasma etching. Plasma contains high energetic ions and radicals for etching that ...
Through via hole fabrication process by deep reactive-ion etching (DRIE): (a) Sample cleaning; (b) Deposition of mask material; (c) Transfer of desired pattern; (d) Desired pattern achieved; (e) ...
What is Atomic Layer Etching? Atomic layer etching (ALE) is a highly controlled and selective etching technique that removes material layer by layer at the atomic scale. It is a cyclic process that ...
Let us help you with your inquiries, brochures and pricing requirements Request A Quote Download PDF Copy Download Brochure The PlasmaPro 100 Cobra ICP RIE system ...
It also noted that to improve productivity and process yield ... more powerful and new semiconductor devices," adding that "plasma etching technology will play a key role in next-generation ...
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